Персона:
Колодко, Добрыня Вячеславич

Организационные подразделения

Организационная единица

Институт нанотехнологий в электронике, спинтронике и фотонике

Институт ИНТЭЛ занимается научной деятельностью и подготовкой специалистов в области исследования физических принципов, проектирования и разработки технологий создания компонентной базы электроники гражданского и специального назначения, а также построения современных приборов на её основе. Наша основная цель – это создание и развитие научно-образовательного центра мирового уровня в области наноструктурных материалов и устройств электроники, спинтроники, фотоники, а также создание эффективной инновационной среды в области СВЧ-электронной и радиационно-стойкой компонентной базы, источников ТГц излучения, ионно-кластерных технологий материалов.

Фамилия

Колодко

Имя

Добрыня Вячеславич

Полная страница элемента

Результаты поиска

Теперь показываю 1 - 10 из 50

Открытый доступ
Tungsten nano-fuzz surface degradation under ion beam
(НИЯУ МИФИ, 2015) Sinelnikov, D.; Kurnaev, V.; Kolodko, D.; Solovev, N.; Колодко, Добрыня Вячеславич; Синельников, Дмитрий Николаевич
Tungsten is the main candidate for plasma facing material in the divertor zone of a thermonuclear reactor due to high melting temperature, high thermal conductivity and low sputtering erosion yield. However, its surface can be modified by "fuzz" nanostructure, which can form in linear simulators and tokamaks [1] under helium irradiation fluence as high as ~1025m-2and sample temperature in the range of 1000-2000 K. Such structure significantly changes the plasma-wall interaction balance, which results in higher probability of unipolar arc ignition. In the case of arcing, erosion yield sharply increases, especially if arcing takes place on a fuzzy surface [2]. Tungsten fuzz is also characterized by high pre-breakdown current intensity, which could indicate the initial stage of unipolar arc ignition [3]. Prebreakdown currents are usually initiated by field emission due to amplification of electric field on sharp cathode relief. So, an investigation of emission properties dependence on surface relief during fuzz formation and destruction seems to be important for the prediction of unipolar arcing.
Только метаданные
Langmuir probe diagnostics of an impulse magnetron discharge with hot Cr target
(2019) Tumarkin, A. V.; Kaziev, A, V.; Leonova, K. A.; Kharkov, M. M.; Kolodko, D. V.; Khomyakov, A. Yu.; Тумаркин, Александр Владимирович; Казиев, Андрей Викторович; Харьков, Максим Михайлович; Колодко, Добрыня Вячеславич
Impulse magnetron discharge (pulse duration 20 ms) with uncooled Cr target has been investigated with a specially designed Langmuir probe setup in a wide range of parameters (magnetic field and discharge power). The spatial distributions of electron temperature and plasma density have been measured in the gasless self-sputtering mode. It has been shown that in the gasless high-power pulsed discharge with hot Cr target, plasma density is as high as 5 x 10(18) M-3 at a pulsed power density of 1430 W/cm(2), while the electron temperature drops to values below 1 eV.
Только метаданные
Properties of millisecond-scale modulated pulsed power magnetron discharge applied for reactive sputtering of zirconia
(2021) Kaziev, A. V.; Kolodko, D. V.; Sergeev, N. S.; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Сергеев, Никита Сергеевич
The electrical properties of a modulated pulsed power (MPP) magnetron discharge were experimentally and theoretically studied in case of reactive sputtering of metallic zirconium target in argon/oxygen mixtures. The high-power pulsing was assisted by pre-ionization provided by a low-power direct current (DC) magnetron discharge filling the pulse-off period. The ranges of stable discharge operation parameters (applied voltage and oxygen flow rate) were determined for pulse-on time of 3 ms and pulse-off time 100-1000 ms. The maximum stable peak power density was 2.1 kW cm(-2). Strong dependence of the MPP discharge current waveforms on the pulse-off time was found, indicating the important role of the pre-ionizing DC discharge. In presence of oxygen, discharge peak current was observed with characteristic width up to 1.5 ms, followed by non-reactive-like plateau region. For theoretical treatment of the observed discharge current behavior, we modified the well-known Berg model of reactive sputtering by introducing the terms required for adequate description of time-dependent poisoning and sputtering processes. The reactive ion implantation term was also transformed to account for the process saturation at high ion current densities. Calculation results from the modified Berg model demonstrated good agreement between our experimental observations of discharge current evolution and target poisoning dynamics in the timescale of milliseconds.
Открытый доступ
LEIS ANALYSIS OF THE W SURFACE DURING WATER VAPOR ADSORPTION
(НИЯУ МИФИ, 2017) Mamedov, N. V.; Kurnaev, V. A.; Sinelnikov, D. N.; Kolodko, D. V.; Sorokin, I. A.; Мамедов, Никита Вадимович; Колодко, Добрыня Вячеславич; Синельников, Дмитрий Николаевич; Сорокин, Иван Александрович
The adsorption of water on the surface is one of the main problems in vacuum technology. Since water is a good adsorbent, its adsorption is the reason that prevents the fast pumping of vacuum systems up to ultra-high vacuum. In addition, water vapor adsorption on metal surfaces during plasma surface interaction is a problem [1]. Singly scattered and recoil ions could form narrow peaks in energy spectra and provide information about atomic composition of the first atomic layer giving information about structure and composition of the surface and very sensitivity to the first layer of atoms [2 -5]. It was also shown [6] that the thickness of light element thin layers on the heavy substrate can be analyzed with good depth resolution (~0,3nm) due to scattering of hydrogen ions with keV energies. Application of ion scattering spectroscopy at pressures up to several mTorr is presented in [7, 8]. In this work experimental results of low energy ion spectroscopy (LEIS) of W samples during water vapor adsorption are presented.
Открытый доступ
ЭКСПЕРИМЕНТАЛЬНЫЕ НАБЛЮДЕНИЯ СПОНТАННОГО ИНИЦИИРОВАНИЯ ИМПУЛЬСОВ ДУГОВЫХ РАЗРЯДОВ ПРИ ВЗАИМОДЕЙСТВИИ ГЕЛИЕВОЙ ПЛАЗМЫ СО СЛОЯМИ ВОЛЬФРАМОВЫХ НАНОВОЛОКОН
(НИЯУ МИФИ, 2024) КУКУШКИНА, М. С.; КАЗИЕВ, А. В.; КОЛОДКО, Д. В.; ХАРЬКОВ, М. М.; РЫКУНОВ, И. Г.; ЦВЕНТУХ, М. М.; Харьков, Максим Михайлович; Колодко, Добрыня Вячеславич; Казиев, Андрей Викторович; Кукушкина, Маргарита Сергеевна
При повышении пристеночного потенциала гелиевой плазмы, воздействующей на поверхность вольфрама, рост наноструктуры волокон вольфрама сменяется распылением, при этом спонтанно (без внешнего триггера) инициируются «пробои» - импульсы взрывной электронной эмиссии [1-3].
Открытый доступ
Cu Metallization of Al2O3 Ceramic by Coating Deposition from Cooled- and Hot-Target Magnetrons
(2023) Kaziev, A. V.; Kolodko, D. V.; Lisenkov, V. Y.; Tumarkin, A. V.; Kharkov, M. M.; Samotaev, N. N.; Oblov, K. Y.; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Тумаркин, Александр Владимирович; Харьков, Максим Михайлович; Самотаев, Николай Николаевич; Облов, Константин Юрьевич
We examined the feasibility of alumina substrate metallization by magnetron deposition of copper coatings with thickness of several tens Вµm for its prospective applications in production of ceramic PCBs and packaging. The films were prepared in magnetron sputtering systems with cooled and thermally insulated (hot) targets. Substrates with different geometries were used, including those with through-holes. Thickness, adhesive properties, and electrical resistivity of produced coatings were analyzed. If the film thickness exceeded ~20 Вµm, we observed its systematic delamination, unless the dedicated CuxOy sub-layer of was introduced between the substrate and the main Cu film. Intermediate copper oxide films were investigated separately by SEM, EDS, and XRD methods, and deposition conditions for predominant growth of favorable tenorite CuO were determined. Prepared composite two-layer CuO + Cu coatings with total thickness of ~100 Вµm demonstrated good adhesion to alumina substrates in scratch-testing and performed much better than Cu-only films both in soldering and thermal cycling tests. We discuss an approach for constructing a reliable metallizing coating by plasma-assisted PVD methods that could be beneficial for complex-shaped ceramic PCBs and packaging.
Только метаданные
Laser-Induced Desorption Spectroscopy with an Inductively Coupled Plasma Source—Examination of Technique Applicability for Detection of Retained Hydrogen
(2024) Rykunov, G. I.; Kolodko, D. V.; Alieva, A. I.; Tumarkin, A. V.; Kaziev, A. V.; Gasparyan, Y. M.; Колодко, Добрыня Вячеславич; Тумаркин, Александр Владимирович; Казиев, Андрей Викторович; Гаспарян, Юрий Микаэлович
Только метаданные
MEPhIST-0 Tokamak for Education and Research
(2023) Krat, S.; Prishvitsyn, A.; Alieva, A.; Vinitskiy, E.; Ulasevich, D.; Izarova, A.; Podolyako, F.; Belov, A.; Chernenko, A.; Sinelnikov, D.; Bulgadaryan, D.; Sorokin, I.; Gubskiy, K.; Kaziev, A.; Kolodko, D.; Tumarkin, V.; Isakova, A.; Grunin, A.; Begrambekov, L.; Melnikov, A.; Крат, Степан Андреевич; Пришвицын, Александр Сергеевич; Виницкий, Егор Александрович; Уласевич, Даниил Львович; Изарова, Анастасия Дмитриевна; Подоляко, Федор Сергеевич; Белов, Андрей Сергеевич; Черненко, Андрей Сергеевич; Синельников, Дмитрий Николаевич; Сорокин, Иван Александрович; Губский, Константин Леонидович; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Тумаркин, Владимир Александрович; Беграмбеков, Леон Богданович; Мельников, Александр Владимирович; Исакова, Анастасия Сергеевна
Открытый доступ
Current-voltage characteristics of an impulse magnetron discharge in target material vapor
(2020) Kaziev, A. V.; Leonova, K. A.; Kharkov, M. M.; Tumarkin, A. V.; Kolodko, D. V.; Khomyakov, A. Y.; Ageychenkov, D. G.; Казиев, Андрей Викторович; Харьков, Максим Михайлович; Тумаркин, Александр Владимирович; Колодко, Добрыня Вячеславич; Агейченков, Дмитрий Григорьевич
© Published under licence by IOP Publishing Ltd.The magnetron discharge with hot (uncooled) target in an impulse mode has been experimentally investigated. The I-V characteristics have been measured depending on the magnetic field strength for three target materials: copper, chromium, and silicon. For melted copper and hot chromium targets, stable gasless (no argon) operation of the magnetron has been demonstrated with maximum impulse power densities about 2.5 kW/cm2 (averaged over the racetrack area). For silicon target, maximum impulse power density was 1.5 kW/cm2 at low argon pressure (0.1 Pa). The magnetic field dependences of discharge parameters have shown the associated changes in differential plasma impedance.
Только метаданные
Characterization of millisecond-scale high-power impulse magnetron discharge in helium
(2020) Kaziev, A. V.; Kolodko, D. V.; Kharkov, M. M.; Rykunov, G. I.; Sergeev, N. S.; Tumarkin, A. V.; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Харьков, Максим Михайлович; Сергеев, Никита Сергеевич; Тумаркин, Александр Владимирович
© 2021 IEEEImpulse magnetron discharges with millisecond-scale pulses-extended duration modes of technological high-power impulse magnetron sputtering (HiPIMS)-have promising applications in pulsed plasma facilities of different kinds due to high ionization degree (up to 90%), suitable duration, and scalable hardware design. Depending on operating conditions, at the same power level, two distinct diffuse regimes can be distinguished: the one with intense target sputtering-long HiPIMS (L-HiPIMS),-and the non-sputtering low-voltage one (non-sputtering magnetron discharge). The majority of existing studies of these discharge forms were made for argon working gas. For a number of prospective high-power pulsed plasma applications (e. g. pulsed plasma accelerators and thrusters), however, the option of using light gases is preferable. Here, the operation of a millisecond-scale impulse magnetron discharge (L-HiPIMS) in helium has been examined. The plasma parameters (electron density, electron temperature) were measured in a time-resolved fashion with a Langmuir probe. The electrical measurements were accompanied with optical emission spectroscopy. The use of the long pulsed modes enables achieving high plasma density and accelerating the ion flux with a peak energy of ~ 10 eV.