Персона: Зебрев, Геннадий Иванович
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Simulation of annealing and the ELDRS in p-MNOS RadFETs
© 2019 by Begell House, Inc.The manifestation of simultaneous annealing in p-MNOS (metal–nitride–oxide‑semiconductor) samples with thick oxide and a pronounced effect of enhanced low-dose-rate sensitivity (ELDRS) are investigated. The simulation was based on experimental data.
Modelling of saturation current of an organic field-effect transistor with accounting for contact resistances
© 2019 Published under licence by IOP Publishing Ltd. The saturation current of an organic field-effect transistor was calculated numerically by bisection method taking into account the source and drain resistances. Dependences of the saturation current as a function of the gate voltage, centred on the threshold voltage, and as a function of the "extrinsic" (taking into account the source and drain resistances) saturation voltage are presented. The calculations were carried out using an iterative scheme assuming the saturation current to be zero for iteration zero and using different numbers of iterations. In addition, we carried out a compact modelling of the saturation current in the framework of the approach we proposed earlier. It is shown that when in the equation for the compact modelling initial value of saturation current of zero value (corresponding to zero iteration) is used, a good agreement with the bisection method of over a wide range of gate voltages is obtained.
Degradation of bipolar transistors at high doses obtained at elevated temperature applied during gamma-irradiation
© 2019 Elsevier LtdThe paper presents investigation results of radiation-induced change in current gain of bipolar transistors at elevated temperature applied during gamma-irradiation with high levels of dose. The regularities obtained during irradiation at elevated temperature coincide qualitatively with the data obtained previously during irradiation at low dose rate. Results of simulation confirm the possibility of applying of developed model of radiation induced degradation of bipolar transistor for irradiation at different temperatures.
Extreme Value Based Estimation of Critical Single Event Failure Probability
© 2019 IEEE.A new survival probability function of ICs under space ion impact is proposed. Unlike the conventional approach, the function is based on the extreme value statistics which is relevant to the critical single event effects.
GEANT4 simulation of nuclear interaction induced soft errors in digital nanoscale electronics: Interrelation between proton and heavy ion impacts
© 2018 Elsevier B.V. A simple and self-consistent approach has been proposed for simulation of the proton-induced soft error rate based on the heavy ion induced single event upset cross-section data and vice versa. The approach relies on the GEANT4 assisted Monte Carlo simulation of the secondary particle LET spectra produced by nuclear interactions. The method has been validated with the relevant in-flight soft error rate data for space protons and heavy ions. An approximate analytical relation is proposed and validated for a fast recalculation between two types of experimental data.
Second International Telecommunication Conference on Advanced Micro- and Nanoelectronic Systems and Technologies
Calibration and electric characterization of p-MNOS RADFETs at different dose rates and temperatures
© 2019 Elsevier B.V.This paper describes the radiation response and I-V characteristics of the stacked p-MNOS based RADFETs measured at different dose rates and irradiation temperatures. It is shown that the enhanced charge trapping takes place at the interface of the thick gate dielectrics in the MNOS transistors at low dose rates (ELDRS). The sensitivity of the radiation effect to irradiation temperature has also experimentally revealed. We associate both effects with the temperature and dose rate dependence of the effective charge yield in the thick oxides described within the framework of the previously proposed model. We have also simulated the I-V characteristics of the transistors for different total doses and irradiation conditions. It has been found the used electric and radiation models qualitatively and semi-quantitatively describe the observed dependencies of the RADFETs’ sensitivity on dose rates and irradiation temperatures for the devices with different thickness of insulators.
Gallium Nitride FET Model
© Published under licence by IOP Publishing Ltd. We have presented an analytical physics-based compact model of GaN power FET, which can accurately describe the I-V characteristics in all operation modes. The model considers the source-drain resistance, different interface trap densities and self-heating effects.
A piecewise approximation for short-channel “extrinsic” MOSFET drain current dependence on drain-to-source bias including linear triode, linear saturation and asymptotic saturation regimes
© The Electrochemical Society.Previously, we transformed the linear drain bias asymptote equation for the MOSFET drain current in the saturation regime from the “intrinsic” case into “extrinsic” case with accounting for the velocity saturation effect. We obtained the equation for the drain current that yielded the nonlinear dependence on the “extrinsic” drain bias in saturation regime in an implicit form. We derived the equation for the differential conductance of the MOSFET at the “saturation point” and proposed a linear approximation for the dependence of the drain current on the “extrinsic” drain bias in the saturation regime for not very high drain bias when nonlinear effects can be neglected. In this paper, we investigate the asymptotic behavior of the implicit equation for the drain current in case when “extrinsic” drain bias tends to infinity. We propose the nonlinear approximation for the drain current asymptotic that describes a slow current rise to its limiting value when the “extrinsic” drain bias tends to infinity. This approximation is based on analytical solution of quartic equation that can be solved easily enough using Ferrari's method.
Impact of Extrinsic Interface Traps and Doping Atoms on Conductivity of Graphene Field Effect Devices
© Published under licence by IOP Publishing Ltd. Near-interfacial oxide traps and chemical impurities on the graphene surface or at the graphene-dielectric interface can be a source of intentional or unintentional doping of graphene sheet. The efficiency of such chemical doping can vary in a wide range depending on parameters of graphene field effect devices. Mechanisms of such sensitivity of doping efficiency to the device characteristics need to be understood. The objective of this paper is to theoretically derive the analytical relations, adapted to the explicit calculation of graphene chemical doping.