Publication: Metal-ion Penning source for thin films deposition
Дата
2015
Авторы
Колодко, Д. В.
Синельников, Д. Н.
Казиев, А. В.
Тумаркин, А. В.
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НИЯУ МИФИ
Аннотация
Recently, research areas dealing with coating processes in a magnetron discharge with melted cathode have experienced intensive development [1–3]. In this mode magnetron discharge is operated in the target's vapour and the plasma in this case is purely metallic. Despite the main contribution to the deposition process is introduced by the vaporized (neutral) component, the coating properties are greatly affected by the ion flux [3]. So, it is important to study the process of deposition by ion flux solely.
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Цитирование
Metal-ion Penning source for thin films deposition [Text.] / Колодко Д. В. [и др.] // Взаимодействие ионов с поверхностью «ВИП – 2015»: труды XXII Международной конференции Том 3. - 2015. - С. 98-100