Publication: Metal-ion Penning source for thin films deposition
| dc.contributor.author | Колодко, Д. В. | |
| dc.contributor.author | Синельников, Д. Н. | |
| dc.contributor.author | Казиев, А. В. | |
| dc.contributor.author | Тумаркин, А. В. | |
| dc.contributor.author | Тумаркин, Александр Владимирович | |
| dc.contributor.author | Колодко, Добрыня Вячеславич | |
| dc.contributor.author | Казиев, Андрей Викторович | |
| dc.contributor.author | Синельников, Дмитрий Николаевич | |
| dc.date.accessioned | 2024-11-29T09:09:56Z | |
| dc.date.available | 2024-11-29T09:09:56Z | |
| dc.date.issued | 2015 | |
| dc.description.abstract | Recently, research areas dealing with coating processes in a magnetron discharge with melted cathode have experienced intensive development [1–3]. In this mode magnetron discharge is operated in the target's vapour and the plasma in this case is purely metallic. Despite the main contribution to the deposition process is introduced by the vaporized (neutral) component, the coating properties are greatly affected by the ion flux [3]. So, it is important to study the process of deposition by ion flux solely. | |
| dc.identifier.citation | Metal-ion Penning source for thin films deposition [Text.] / Колодко Д. В. [и др.] // Взаимодействие ионов с поверхностью «ВИП – 2015»: труды XXII Международной конференции Том 3. - 2015. - С. 98-100 | |
| dc.identifier.uri | https://openrepository.mephi.ru/handle/123456789/23417 | |
| dc.publisher | НИЯУ МИФИ | |
| dc.subject | Конференции НИЯУ МИФИ | |
| dc.title | Metal-ion Penning source for thin films deposition | |
| dc.type | Article | |
| dspace.entity.type | Publication | |
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