Персона:
Колодко, Добрыня Вячеславич

Организационные подразделения

Организационная единица

Институт нанотехнологий в электронике, спинтронике и фотонике

Институт ИНТЭЛ занимается научной деятельностью и подготовкой специалистов в области исследования физических принципов, проектирования и разработки технологий создания компонентной базы электроники гражданского и специального назначения, а также построения современных приборов на её основе. Наша основная цель – это создание и развитие научно-образовательного центра мирового уровня в области наноструктурных материалов и устройств электроники, спинтроники, фотоники, а также создание эффективной инновационной среды в области СВЧ-электронной и радиационно-стойкой компонентной базы, источников ТГц излучения, ионно-кластерных технологий материалов.

Фамилия

Колодко

Имя

Добрыня Вячеславич

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Результаты поиска

Теперь показываю 1 - 10 из 22

Только метаданные
Direct ion content measurements in a non-sputtering magnetron discharge
(2019) Kaziev, A. V.; Kolodko, D. V.; Ageychenkov, D. G.; Tumarkin, A. V.; Kharkov, M. M.; Stepanova, T. V.; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Агейченков, Дмитрий Григорьевич; Тумаркин, Александр Владимирович; Харьков, Максим Михайлович; Степанова, Татьяна Владимировна
In present contribution we report the first direct measurements of ion fluxes in a nonsputtering magnetron discharge (NSMD) with Al cathode in Ar/O-2 mixtures. The diagnostic unit comprising three-electrode electrostatic lens ion extractor, magnetic sector mass-analyzer, and a vacuum electron multiplier was calibrated and then used to record the time-resolved ion counts of Al+ and Ar+ both in NSMD and arc regimes. The results clearly indicate that in NSMD the dominant species are Ar ions while Al ion signal is lower than the sensitivity limit due to noise level, in contrast to the arc discharge. The capabilities of the diagnostics setup and its sensitivity limits are discussed.
Только метаданные
Comparison of thermal properties of a hot target magnetron operated in DC and long HIPIMS modes
(2021) Kaziev, A. V.; Kolodko, D. V.; Tumarkin, A, V.; Kharkov, M. M.; Lisenkov, V. Y.; Sergeev, N. S.; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Тумаркин, Александр Владимирович; Харьков, Максим Михайлович; Сергеев, Никита Сергеевич
© 2021 Elsevier B.V.Thermal properties of the magnetron discharge with uncooled copper and chromium targets were studied experimentally and theoretically for DC and long HiPIMS (L-HiPIMS) operation modes. A set of thermal fluxes was considered to build a numerical model of the hot target exposed to DC and high-power pulsed plasma. The modeling results were tested in the experiments. The temperature of targets was measured directly in course of magnetron discharge operation with an elaborated contact thermocouple method. The measurements were made in two modes. At first the temporal evolution of temperature was recorded for a fixed applied discharge power. The results were found to well agree with temperature values expected from calculations. At 2 kW power, it takes ~50 s to reach the melting point of copper. The steady-state temperature values were also measured for a number of discharge power levels. The obtained dependence clearly demonstrated that the main mechanisms of the target heat balance at high temperatures are surface radiation and heat transfer due to thermal conductivity of the heat insulation supports between the target and water-cooled cathode. The parameters of DC hot target magnetron were compared to the high-power pulsed regime with the pulse-on time 20 ms. A promising method of a hot target magnetron discharge operation was considered that involves applying long (>20 ms) high-power pulses to the target pre-heated in the DC mode during the pulse-off period.
Только метаданные
Properties of millisecond-scale modulated pulsed power magnetron discharge applied for reactive sputtering of zirconia
(2021) Kaziev, A. V.; Kolodko, D. V.; Sergeev, N. S.; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Сергеев, Никита Сергеевич
The electrical properties of a modulated pulsed power (MPP) magnetron discharge were experimentally and theoretically studied in case of reactive sputtering of metallic zirconium target in argon/oxygen mixtures. The high-power pulsing was assisted by pre-ionization provided by a low-power direct current (DC) magnetron discharge filling the pulse-off period. The ranges of stable discharge operation parameters (applied voltage and oxygen flow rate) were determined for pulse-on time of 3 ms and pulse-off time 100-1000 ms. The maximum stable peak power density was 2.1 kW cm(-2). Strong dependence of the MPP discharge current waveforms on the pulse-off time was found, indicating the important role of the pre-ionizing DC discharge. In presence of oxygen, discharge peak current was observed with characteristic width up to 1.5 ms, followed by non-reactive-like plateau region. For theoretical treatment of the observed discharge current behavior, we modified the well-known Berg model of reactive sputtering by introducing the terms required for adequate description of time-dependent poisoning and sputtering processes. The reactive ion implantation term was also transformed to account for the process saturation at high ion current densities. Calculation results from the modified Berg model demonstrated good agreement between our experimental observations of discharge current evolution and target poisoning dynamics in the timescale of milliseconds.
Только метаданные
Ion current optimization in a magnetron with tunable magnetic field configuration
(2021) Kaziev, A. V.; Ageychenkov, D. G.; Tumarkin, A. V.; Kolodko, D. V.; Sergeev, N. S.; Kharkov, M. M.; Leonova, K. A.; Казиев, Андрей Викторович; Агейченков, Дмитрий Григорьевич; Тумаркин, Александр Владимирович; Колодко, Добрыня Вячеславич; Сергеев, Никита Сергеевич; Харьков, Максим Михайлович
© 2021 Institute of Physics Publishing. All rights reserved.The response of the ion current in the substrate region to the magnetic system configuration of a circular magnetron was studied during direct current sputtering of aluminum target. The unbalancing degree induced by changing of magnets’ positions was modelled with finite element methods. The ion saturation current in the substrate region showed more than twofold variation with unbalancing degree in the range 0.6–1.2. The dependence was non-monotonic, and the system was optimized to maximize the substrate ion current. The Langmuir probe diagnostics showed plasma density ~ 1016 m–3 in the optimized magnetic configuration.
Только метаданные
Estimation of MoS2 Coating Performance on Bronze and Steel in Vacuum at High Temperatures
(2022) Prozhega, M. V.; Reschikov, E. O.; Kharkov, M. M.; Rykunov, G. I.; Kaziev, A. V.; Kukushkina, M. S.; Kolodko, D. V.; Stepanova, T. V.; Харьков, Максим Михайлович; Казиев, Андрей Викторович; Кукушкина, Маргарита Сергеевна; Колодко, Добрыня Вячеславич; Степанова, Татьяна Владимировна
© 2022 by the authors. Licensee MDPI, Basel, Switzerland.We compared two modes of magnetron sputter deposition of MoS2 on substrates made of steel AISI 316L and bronze CuAl9NiFe4Mn1 with different initial roughness Ra 0.05–2.32 µm. The deposition was carried out at a bias voltage of −20 and +100 V, and the deposition rate of these modes differed by 30%. Measurements of the friction coefficient and lifetime tests were made in accordance with ASTM G133. Measurements of the friction coefficient and lifetime tests in vacuum at load 7H, temperature of samples 250◦C, and pressure in the chamber <10−6 Pa were carried out according to ASTM G133. The adhesive strength, the chemical composition of the coatings before and after tribological tests, the degree of crystallinity of the coatings, and the distance between the planes were evaluated. Mechanical and structural properties of coatings are discussed concerning the deposition mode parameters. The average coefficient of friction of the MoS2 coatings in steady-state friction did not exceed 0.051 for all samples. The influence of the sample pretreatment method on the growth of molybdenum disulfide crystals was revealed.
Только метаданные
Evidence of 1000 eV positive oxygen ion flux generated in reactive HiPIMS plasma
(2023) Kolodko, D. V.; Ageychenkov, D. G.; Lisenkov, V. Y.; Kaziev, A. V.; Колодко, Добрыня Вячеславич; Агейченков, Дмитрий Григорьевич; Казиев, Андрей Викторович
The arrival of highly energetic (near 1000 eV) positive atomic oxygen ions at the substrate region has been detected in a unipolar reactive high-power impulse magnetron sputtering process operated with an uncooled copper target in argon-oxygen mixtures. Examination of the ion fluxes from discharge plasma was performed with a magnetic sector mass-spectrometer and an electrostatic energy analyzer. The energy of fast positive O+ ions is close to the value of eV (d) (e-elementary charge, V (d)-discharge voltage), which indicates their connection to the well-studied fraction of negative O- ions, which undergo acceleration in the cathode sheath. After switching the oxygen gas supply off, the flux of energetic O+ species decreases gradually as the poisoned target surface layers become depleted of oxygen due to sputtering in pure argon. Presumably, the observed energetic O+ ions originate as a result of low-angle scattering of fast negative O- ions from other charged or neutral species in the plasma followed by electron detachment, ionization, or charge exchange.
Только метаданные
SIMULATION OF TARGET SURFACE CHEMICAL STATE IN A HOT-TARGET HIPIMS PROCESS МОДЕЛИРОВАНИЕ ХИМИЧЕСКОГО СОСТОЯНИЯ ПОВЕРХНОСТИ МИШЕНИ В СИМР С ГОРЯЧЕИ МИШЕНЬЮ
(2023) Kaziev, A. V.; Kolodko, D. V.; Tumarkin, A. V.; Kharkov, M.; Lisenkov, V. Y.; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Тумаркин, Александр Владимирович; Харьков, Максим Михайлович
Только метаданные
Flux of High-Energy Positive Oxygen Ions from Plasma to a Substrate in a Pulsed Magnetron Discharge with a Hot Target
(2023) Kolodko, D. V.; Kaziev, A. V.; Ageichenkov, D. G.; Lisenkov, V. Y.; Колодко, Добрыня Вячеславич; Казиев, Андрей Викторович; Агейченков, Дмитрий Григорьевич
Только метаданные
Preparation of Silicon Oxide Films by a Hot-Target Impulse Magnetron Deposition in a Reactive Mixture
(2023) Lisenkov, V. Y.; Kharkov, M. M.; Kolodko, D. V.; Tumarkin, A. V.; Kaziev, A. V.; Харьков, Максим Михайлович; Колодко, Добрыня Вячеславич; Тумаркин, Александр Владимирович; Казиев, Андрей Викторович
Только метаданные
MAGNETRON SPUTTER DEPOSITION OF TUNGSTEN COATINGS IN DEUTERIUM–HELIUM MIXTURES
(2023) Kharkov, M.; Lomonosov, G. S.; Kolodko, D. V.; Kukushkina, M. S.; Kaziev, A. V.; Tumarkin, A. V.; Ogorodnikova, O. V.; Харьков, Максим Михайлович; Ломоносов, Глеб Сергеевич; Колодко, Добрыня Вячеславич; Кукушкина, Маргарита Сергеевна; Казиев, Андрей Викторович; Тумаркин, Александр Владимирович; Огородникова, Ольга Вячеславовна