Персона:
Колодко, Добрыня Вячеславич

Организационные подразделения

Организационная единица

Институт нанотехнологий в электронике, спинтронике и фотонике

Институт ИНТЭЛ занимается научной деятельностью и подготовкой специалистов в области исследования физических принципов, проектирования и разработки технологий создания компонентной базы электроники гражданского и специального назначения, а также построения современных приборов на её основе. Наша основная цель – это создание и развитие научно-образовательного центра мирового уровня в области наноструктурных материалов и устройств электроники, спинтроники, фотоники, а также создание эффективной инновационной среды в области СВЧ-электронной и радиационно-стойкой компонентной базы, источников ТГц излучения, ионно-кластерных технологий материалов.

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Колодко

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Добрыня Вячеславич

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Теперь показываю 1 - 10 из 12

Только метаданные
Diagnostics of ion fluxes in low-temperature laboratory and industrial plasmas
(2019) Kolodko, D, V.; Ageychenkov, D. G.; Kaziev, A, V.; Leonova, K. A.; Kharkov, M. M.; Tumarkin, A. V.; Колодко, Добрыня Вячеславич; Агейченков, Дмитрий Григорьевич; Казиев, Андрей Викторович; Харьков, Максим Михайлович; Тумаркин, Александр Владимирович
We studied the ion fluxes on metal surfaces in the inductively coupled plasma reactor as a test facility. The gas mixture of argon and nitrogen was used, with 0.44 Pa total pressure. The radiofrequency power was varied in a wide range (250-2000 W). The ion fluxes were sampled in situ using a specially designed electrostatic extractor and then analyzed with a custom-built magnetic sector mass-separator. The gas composition was independently monitored by the quadrupole analyzer. All measurements were accompanied by optical emission spectroscopy (OES). The correlations of measured optical and corpuscular data are discussed. The conversion function linking optical and corpuscular intensities for Ar/N-2 radiofrequency discharge was determined.
Только метаданные
Direct ion content measurements in a non-sputtering magnetron discharge
(2019) Kaziev, A. V.; Kolodko, D. V.; Ageychenkov, D. G.; Tumarkin, A. V.; Kharkov, M. M.; Stepanova, T. V.; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Агейченков, Дмитрий Григорьевич; Тумаркин, Александр Владимирович; Харьков, Максим Михайлович; Степанова, Татьяна Владимировна
In present contribution we report the first direct measurements of ion fluxes in a nonsputtering magnetron discharge (NSMD) with Al cathode in Ar/O-2 mixtures. The diagnostic unit comprising three-electrode electrostatic lens ion extractor, magnetic sector mass-analyzer, and a vacuum electron multiplier was calibrated and then used to record the time-resolved ion counts of Al+ and Ar+ both in NSMD and arc regimes. The results clearly indicate that in NSMD the dominant species are Ar ions while Al ion signal is lower than the sensitivity limit due to noise level, in contrast to the arc discharge. The capabilities of the diagnostics setup and its sensitivity limits are discussed.
Только метаданные
Langmuir probe diagnostics of an impulse magnetron discharge with hot Cr target
(2019) Tumarkin, A. V.; Kaziev, A, V.; Leonova, K. A.; Kharkov, M. M.; Kolodko, D. V.; Khomyakov, A. Yu.; Тумаркин, Александр Владимирович; Казиев, Андрей Викторович; Харьков, Максим Михайлович; Колодко, Добрыня Вячеславич
Impulse magnetron discharge (pulse duration 20 ms) with uncooled Cr target has been investigated with a specially designed Langmuir probe setup in a wide range of parameters (magnetic field and discharge power). The spatial distributions of electron temperature and plasma density have been measured in the gasless self-sputtering mode. It has been shown that in the gasless high-power pulsed discharge with hot Cr target, plasma density is as high as 5 x 10(18) M-3 at a pulsed power density of 1430 W/cm(2), while the electron temperature drops to values below 1 eV.
Только метаданные
Deposition of Metal-Doped Diamond-Like Films Using a Hollow Cathode Discharge
(2020) Sorokin, I. A.; Kolodko, D. V.; Krasnobaev, K. I.; Сорокин, Иван Александрович; Колодко, Добрыня Вячеславич
© 2020, Pleiades Publishing, Inc.Abstract—A simple technique is presented for producing diamond-like films with copper impurity by sputtering the surface of a copper cathode with argon ions in a glow discharge with a hollow cathode with simultaneous chemical deposition diamond-like films on its surface. It was shown that a small (up to 1: 1000) admixture of propane at the pressure of the plasma forming gas of 40 Pa does not affect the plasma parameters, however, it allows you to vary the relative copper content in the diamond-like film.
Только метаданные
Effects of Ar ion irradiation in an ICP discharge on the titanium surface topology
(2020) Chernyh, N. A.; Kharkov, M. M.; Kaziev, A. V.; Danilyuk, D. V.; Kukushkina, M. S.; Tumarkin, A. V.; Kolodko, D. V.; Харьков, Максим Михайлович; Казиев, Андрей Викторович; Кукушкина, Маргарита Сергеевна; Тумаркин, Александр Владимирович; Колодко, Добрыня Вячеславич
© 2020 Elsevier B.V.VT1-0 (Russian equivalent of Grade 2) titanium surfaces were modified under argon ion bombardment from the low-pressure inductively coupled plasma (ICP). The ion processing allowed us to prepare various types of structures on titanium with controlled characteristic dimensions at nano- and miscroscale (from tens of nm to 3 µm). The hillock, porous, conical, wall/cell structures as well as their combinations have been obtained. The topology type and the characteristic dimensions of surface features depend on the current density js, Ar ion energy Ei, irradiation fluence Φ (or processing time t), and the sample temperature T during the treatment. The microstructures appear on the surface provided the titanium sample is irradiated at temperatures below 900 °C. The sample temperature was determined by both the average current density (jsav from 0.2 to 20 mA/cm2) and the ion energy (Ei from 150 to 1500 eV). A certain fluence is required for uniform surface coverage with microstructures. We suppose that the titanium surface texturing is a result of a complex interplay of the following mechanisms: sputtering, re-sputtering (shadowing), crystal lattice transformation, accumulation and annihilation of defects, and hypothetically, argon retention.
Только метаданные
Growth of Thin Graphite Films on a Dielectric Substrate using Heteroepitaxial Synthesis
(2020) Sorokin, I. A.; Kolodko, D. V.; Luzanov, V. A.; Shustin, E. G.; Сорокин, Иван Александрович; Колодко, Добрыня Вячеславич
A technique for growing thin graphite films on a dielectric substrate by annealing the Al2O3(0001)/Ni(111)/ta-C structure has been optimized. This technique is based on catalytic decomposition of hydrocarbons on the surface of a single-crystal catalyst metal film on a dielectric substrate and subsequent diffusion and crystallization of carbon between the metal film and the substrate. A thin graphite film with a low density of crystal-structure defects is obtained on the dielectric substrate after chemical etching of the metal film.
Только метаданные
Characterization of millisecond-scale high-power impulse magnetron discharge in helium
(2020) Kaziev, A. V.; Kolodko, D. V.; Kharkov, M. M.; Rykunov, G. I.; Sergeev, N. S.; Tumarkin, A. V.; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Харьков, Максим Михайлович; Сергеев, Никита Сергеевич; Тумаркин, Александр Владимирович
© 2021 IEEEImpulse magnetron discharges with millisecond-scale pulses-extended duration modes of technological high-power impulse magnetron sputtering (HiPIMS)-have promising applications in pulsed plasma facilities of different kinds due to high ionization degree (up to 90%), suitable duration, and scalable hardware design. Depending on operating conditions, at the same power level, two distinct diffuse regimes can be distinguished: the one with intense target sputtering-long HiPIMS (L-HiPIMS),-and the non-sputtering low-voltage one (non-sputtering magnetron discharge). The majority of existing studies of these discharge forms were made for argon working gas. For a number of prospective high-power pulsed plasma applications (e. g. pulsed plasma accelerators and thrusters), however, the option of using light gases is preferable. Here, the operation of a millisecond-scale impulse magnetron discharge (L-HiPIMS) in helium has been examined. The plasma parameters (electron density, electron temperature) were measured in a time-resolved fashion with a Langmuir probe. The electrical measurements were accompanied with optical emission spectroscopy. The use of the long pulsed modes enables achieving high plasma density and accelerating the ion flux with a peak energy of ~ 10 eV.
Только метаданные
Model of a Plasma Layer Formed by an Electron Beam
(2020) Tarakanov, V. P.; Shustin, E. G.; Kolodko, D. V.; Sorokin, I. A.; Колодко, Добрыня Вячеславич; Сорокин, Иван Александрович
© 2020, Pleiades Publishing, Ltd.Abstract—: Results are presented of the particle-in-cell numerical simulations by the KARAT code of the formation of a plasma–beam discharge in the absence of both the longitudinal magnetic field and the initial plasma. Oscillations of the electric field generated by the plasma–beam instability in the electron beam region almost do not affect the plasma at the periphery of the system. Simulation results are compared to the results obtained earlier by a simplified model and to the results of test experiments. The spatial distributions of the plasma density and electron temperature qualitatively agree with the experimental results.
Только метаданные
Plasma behavior in e×h pulse discharge
(2020) Rohmanenkov, A.; Solodovnikov, A.; Mamedov, N.; Maslennikov, S.; Sorokin, I.; Kolodko, D.; Мамедов, Никита Вадимович; Масленников, Сергей Павлович; Сорокин, Иван Александрович; Колодко, Добрыня Вячеславич
© 2020 IEEE.The paper presents the results of experiments and PIC (particle-in-cell) simulations of ignition characteristics of miniature pulsed penning ion source. Also the dependence of the discharge current pulse on the gas pressure and magnetic field are presented. Plasma behavior (electron and ion density in axial and radial dimensional) depending on magnitude (and configuration) of the magnetic field and pressure (working gas is deuterium) was shown.
Только метаданные
Comparison of thermal properties of a hot target magnetron operated in DC and long HIPIMS modes
(2021) Kaziev, A. V.; Kolodko, D. V.; Tumarkin, A, V.; Kharkov, M. M.; Lisenkov, V. Y.; Sergeev, N. S.; Казиев, Андрей Викторович; Колодко, Добрыня Вячеславич; Тумаркин, Александр Владимирович; Харьков, Максим Михайлович; Сергеев, Никита Сергеевич
© 2021 Elsevier B.V.Thermal properties of the magnetron discharge with uncooled copper and chromium targets were studied experimentally and theoretically for DC and long HiPIMS (L-HiPIMS) operation modes. A set of thermal fluxes was considered to build a numerical model of the hot target exposed to DC and high-power pulsed plasma. The modeling results were tested in the experiments. The temperature of targets was measured directly in course of magnetron discharge operation with an elaborated contact thermocouple method. The measurements were made in two modes. At first the temporal evolution of temperature was recorded for a fixed applied discharge power. The results were found to well agree with temperature values expected from calculations. At 2 kW power, it takes ~50 s to reach the melting point of copper. The steady-state temperature values were also measured for a number of discharge power levels. The obtained dependence clearly demonstrated that the main mechanisms of the target heat balance at high temperatures are surface radiation and heat transfer due to thermal conductivity of the heat insulation supports between the target and water-cooled cathode. The parameters of DC hot target magnetron were compared to the high-power pulsed regime with the pulse-on time 20 ms. A promising method of a hot target magnetron discharge operation was considered that involves applying long (>20 ms) high-power pulses to the target pre-heated in the DC mode during the pulse-off period.