Publication: Parametric layout cell design of N-MOS transistor with enhanced radiation hardened properties
Дата
2020
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© 2020 American Institute of Physics Inc.. All rights reserved.NMOS design methodology with increased radiation hardness based on the standard manufacturer's technological libraries is presented. Key model parameters definition are discussed, as well as layout design for parametrized components and connected with layout configuration features when projecting integral layout. Test structures are presented for components characterization in radiation environment.
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Khokhlov, K. O. Parametric layout cell design of N-MOS transistor with enhanced radiation hardened properties / Khokhlov, K.O., Serazetdinov, A.R., Atkin, E.V. // AIP Conference Proceedings. - 2020. - 2313. - 10.1063/5.0036567
URI
https://www.doi.org/10.1063/5.0036567
https://www.scopus.com/record/display.uri?eid=2-s2.0-85097977773&origin=resultslist
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000679348500270
https://openrepository.mephi.ru/handle/123456789/22858
https://www.scopus.com/record/display.uri?eid=2-s2.0-85097977773&origin=resultslist
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000679348500270
https://openrepository.mephi.ru/handle/123456789/22858