Publication:
Creation of Thin Films of NbN at Room Temperature of the Substrate

Дата
2021
Авторы
Gurovich, B. A.
Goncharov, B. V.
Kutuzov, L. V.
Stolyarov, L. V.
Prikhod'ko, K. E.
Journal Title
Journal ISSN
Volume Title
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Научные группы
Организационные подразделения
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Организационная единица
Институт ядерной физики и технологий
Цель ИЯФиТ и стратегия развития - создание и развитие научно-образовательного центра мирового уровня в области ядерной физики и технологий, радиационного материаловедения, физики элементарных частиц, астрофизики и космофизики.
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Аннотация
© 2021, Pleiades Publishing, Ltd.Abstract: Magnetron sputtering is used for preparing thin NbN films. The films are deposited on sapphire substrates at temperatures from 20 to 300°C. The superconducting transition temperature for various samples is in the range of 8–14 K depending on the substrate temperature during deposition. The critical current density jc is in the range of 0.8–8 MA/cm2, which makes it possible to use these films to create multilayer structures due to the absence of anneals, which each underlying layer of structures is subjected to during the deposition of each subsequent layer.
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Цитирование
Creation of Thin Films of NbN at Room Temperature of the Substrate / Gurovich, B.A. [et al.] // Physics of the Solid State. - 2021. - 10.1134/S1063783421090092
URI
https://www.doi.org/10.1134/S1063783421090092
 https://www.scopus.com/record/display.uri?eid=2-s2.0-85121558895&origin=resultslist
 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000732514300020
 https://openrepository.mephi.ru/handle/123456789/25180
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