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FABRICATION OF FINE-DISPERSED COATINGS AT DEPOSITION WITH SIMULTANEOUS SPUTTERING

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dc.contributor.authorRogov, A. V.
dc.contributor.authorMartynenko, Yu. V.
dc.contributor.authorKapustin, Yu. V.
dc.contributor.authorBelova, N. E.
dc.contributor.authorМартыненко, Юрий Владимирович
dc.date.accessioned2024-12-02T08:44:20Z
dc.date.available2024-12-02T08:44:20Z
dc.date.issued2015
dc.description.abstractNew low temperature method of homogeneous Mo nanocrystallite coating formation was developed. The coating was formed at magnetron Mo deposition on polished Mo polycrystalline substrate with simultaneous ion sputtering. Deposition and sputtering were performed in combined discharge of magnetron – hole cathode [1]. X-ray difractometry and SEM were used for coating structure investigation. A theoretical model was developed for coating formation by proposed method. At low excess of deposition rate over sputtering rate uncontrolled fast growth of some Mocrystallites is effectively suppressed, being fine dispersed coating is formed. Such coatings can be used as a radiation stable reflecting coatings for high temperature plasma diagnostic mirrors [2, 3]. The proposed method can be used also for other materials modification, semiconductors included.
dc.identifier.citationFABRICATION OF FINE-DISPERSED COATINGS AT DEPOSITION WITH SIMULTANEOUS SPUTTERING [Text.]/ Rogov A. V. [и др.] // Взаимодействие ионов с поверхностью «ВИП – 2015»: труды XXII Международной конференции Том 3. - 2015. -С. 150-152
dc.identifier.urihttps://openrepository.mephi.ru/handle/123456789/25503
dc.publisherНИЯУ МИФИ
dc.subjectКонференции НИЯУ МИФИ
dc.titleFABRICATION OF FINE-DISPERSED COATINGS AT DEPOSITION WITH SIMULTANEOUS SPUTTERING
dc.typeArticle
dspace.entity.typePublication
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2015_Взаимодействие ионов с поверхностью (ВИП)