Publication: CHARACTERISATION OF PLASMA PARAMETERS OF INDUCTIVELY - COUPLED PLASMA SOURCE AND ITS APPLICATION FOR NITRIDING OF STEELS
Дата
2015
Авторы
Meshcheryakova, E.
Zibrov, M.
Kaziev, A.
Khodachenko, G.
Pisarev, A.
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Издатель
НИЯУ МИФИ
Аннотация
Inductively coupled plasma (ICP) sources are widely used in many technological applications, including etching of semiconductors, thin film deposition, and surface modification of materials [1]. In particular, ICP plasmas could be attractive for plasma nitriding of metals (steels, titanium, aluminium, etc.) due to the following features: high ionization degree (up to several percent), low pressure (down to 10−4 mbar) that results in increase of energy of ions bombarding a substrate and reduction of their energy spread, and relatively small impurity content in the plasma due to electrodeless nature of the discharge. Consequently, thorough characterization of plasma parameters in ICP sources is essential for revealing the optimal regimes of plasma nitriding.
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Конференции НИЯУ МИФИ
Цитирование
CHARACTERISATION OF PLASMA PARAMETERS OF INDUCTIVELY - COUPLED PLASMA SOURCE AND ITS APPLICATION FOR NITRIDING OF STEELS [Text.] / Meshcheryakova E. [и тд.]// Взаимодействие ионов с поверхностью «ВИП – 2015»: труды XXII Международной конференции Том 3. - 2015. - С. 274-277