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Мартыненко, Юрий Владимирович

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Институт лазерных и плазменных технологий
Стратегическая цель Института ЛаПлаз – стать ведущей научной школой и ядром развития инноваций по лазерным, плазменным, радиационным и ускорительным технологиям, с уникальными образовательными программами, востребованными на российском и мировом рынке образовательных услуг.
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Юрий Владимирович
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  • Публикация
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    FABRICATION OF FINE-DISPERSED COATINGS AT DEPOSITION WITH SIMULTANEOUS SPUTTERING
    (НИЯУ МИФИ, 2015) Rogov, A. V.; Martynenko, Yu. V.; Kapustin, Yu. V.; Belova, N. E.; Мартыненко, Юрий Владимирович
    New low temperature method of homogeneous Mo nanocrystallite coating formation was developed. The coating was formed at magnetron Mo deposition on polished Mo polycrystalline substrate with simultaneous ion sputtering. Deposition and sputtering were performed in combined discharge of magnetron – hole cathode [1]. X-ray difractometry and SEM were used for coating structure investigation. A theoretical model was developed for coating formation by proposed method. At low excess of deposition rate over sputtering rate uncontrolled fast growth of some Mocrystallites is effectively suppressed, being fine dispersed coating is formed. Such coatings can be used as a radiation stable reflecting coatings for high temperature plasma diagnostic mirrors [2, 3]. The proposed method can be used also for other materials modification, semiconductors included.
  • Публикация
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    УМЕНЬШЕНИЕ ДЕФЕКТНОСТИ НАНОКРИСТАЛЛИТНЫХ ПОКРЫТИЙ НА ПОЛИКРИСТАЛЛИЧЕСКИХ ПОДЛОЖКАХ ПОСЛЕ ИОННОГО РАСПЫЛЕНИЯ С ОДНОВРЕМЕННЫМ НАПЫЛЕНИЕМ
    (НИЯУ МИФИ, 2015) Рогов, А. В.; Капустин, Ю. В.; Мартыненко, Ю. В.; Мартыненко, Юрий Владимирович
    Two types of structural defects of Mo coatings deposited on the polished Mo polycrystalline substrates were found. Firstly small (~0.1 μm) crystallites with different orientations and sizes are formed on different substrate grains. Secondly many large (~1 μm) inclusions appear on the coating surface. Preliminary buffer layer created in regime of ion sputtering with simultaneous magnetron deposition allows to eliminate the both kind of defects. А theoretical model of the phenomena was developed.
  • Публикация
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    Structure Changes in Carbon Films Prepared by Electron-Beam-Assisted Deposition
    (2019) Korshunov, S. N.; Lebedev, A. M.; Svechnikov, N. Y.; Skorlupkin, I. D.; Martynenko, Y. V.; Мартыненко, Юрий Владимирович
    © 2019, Pleiades Publishing, Ltd.Abstract: Carbon films 50–180 nm thick on nickel substrates are fabricated by the ion sputtering of graphite and the deposition of heavy hydrocarbons from the gas phase with simultaneous electron irradiation. Irradiation results in the formation of bonds in carbon films due to the sp and sp3 hybridization of orbitals (sp and sp3 bonds), mainly, sp3 bonds. A fraction of these bonds does not change with growth in the electron energy; it increases three-fold with a reduction in the temperature and an increase in the electron current density. Electron irradiation enhances the film microhardness which exceeds 12 GPa. The films, prepared by heavy hydrocarbon deposition, contain CHn bonds and a small fraction of sp3 bonds. The maximum value of the microhardness of the hydrocarbon films is no more than 4.5 GPa. The analysis of the proposed model of the kinetics of forming different allotropic phases in a carbon film to be deposited shows that a temperature reduction changes the specific volume of an atom in the lattice, while under conditions of simultaneous electron irradiation, it appreciably increases the content of the phase with sp3 bonds. The effect of spi-bond breakage during electron-beam-assisted deposition weakly depends on the electron energy. The weak excitations of electrons of carbon atoms can also result in the formation of sp3 bonds and increases their concentration with growth in the electron current density.
  • Публикация
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    MHD Thruster with Capillary-Porous Electrodes
    (2019) Ilgisonis, V. I.; Martynenko, Y. V.; Мартыненко, Юрий Владимирович
    © 2019, Pleiades Publishing, Ltd. Abstract: Capillary-porous electrodes for plasma MHD devices are considered. The electrodes can be continuously renewable and allow one to use a scheme of the inverted MHD generator (i.e., MHD accelerator) as a thruster for interorbital flights. Two types of plasma acceleration are considered: (i) Lorentz force acceleration with a primary current perpendicular to the acceleration direction (Faraday scheme) and (ii) acceleration based on the Hall effect. In the first case, the thruster has advantages only at thrust powers exceeding 1 MW, while in the second case, the thrust and specific impulse are comparable with those of the known analogs (or even surpass them) already at powers of 500–1000 kW. The operating conditions of capillary-porous electrodes are formulated.