Publication:
Helium accumulation in tungsten layers deposited in Ar-He magnetron discharge

Дата
2020
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Издатель
Научные группы
Организационные подразделения
Организационная единица
Институт лазерных и плазменных технологий
Стратегическая цель Института ЛаПлаз – стать ведущей научной школой и ядром развития инноваций по лазерным, плазменным, радиационным и ускорительным технологиям, с уникальными образовательными программами, востребованными на российском и мировом рынке образовательных услуг.
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Аннотация
© Published under licence by IOP Publishing Ltd.W-He co-deposition was studied by means of in-vacuo thermal desorption spectroscopy. W-He co-deposited layers were produced at substrate temperatures varied from 400 K to 800 K with a 50 K temperature step. It was found that the He content decreases from ~1.7 at. % at 400 K to ~0.17 at. % at 750 K. At 800 K, an increase in the He content was observed, that should be caused by significant changes in the film structure. Helium TDS spectra had two main peaks with maxima in the 500-600 K range and at ~960 K; the peaks observed are similar to those previously seen for He ion implantation in W. Several scaling expressions are proposed for He/W vs. T.
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Helium accumulation in tungsten layers deposited in Ar-He magnetron discharge / Krat, S. [et al.] // Journal of Physics: Conference Series. - 2020. - 1686. - № 1. - 10.1088/1742-6596/1686/1/012020
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