Publication: Rationale of the need to the development of semiconductor industry in Russia with the 28 nanometer semiconductor device fabrication node and below
Дата
2019
Авторы
Fomina, A. V.
Frantsuzova, V. V.
Petrenko, Ya. I.
Kornachev, D. V.
Avanesyan, A. R.
Journal Title
Journal ISSN
Volume Title
Издатель
Аннотация
© 2019 Published under licence by IOP Publishing Ltd. This article describes the systemic problem of the development of the Russian semiconductor industry due to the lack of national production of integrated microcircuits with topological standards below 65 nm. Here are the results of the analysis of the feasibility of production lines of integrated circuits developing, depending on the forecasted volume of demand for various categories of semiconductor products, the technological backlog of Russian organizations and the estimated cost of the project. In this article, there are suggestions on possible sources of project financing and measures of non-financial support. Also, it describes the general technological parameters of the created production. It contains an assessment of key performance indicators of the project and the impact of its implementation on related technological areas.
Описание
Ключевые слова
Цитирование
Rationale of the need to the development of semiconductor industry in Russia with the 28 nanometer semiconductor device fabrication node and below / Fomina, A.V. [et al.] // IOP Conference Series: Materials Science and Engineering. - 2019. - 498. - № 1. - 10.1088/1757-899X/498/1/012043
URI
https://www.doi.org/10.1088/1757-899X/498/1/012043
https://www.scopus.com/record/display.uri?eid=2-s2.0-85065594081&origin=resultslist
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000472784800043
https://openrepository.mephi.ru/handle/123456789/17952
https://www.scopus.com/record/display.uri?eid=2-s2.0-85065594081&origin=resultslist
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000472784800043
https://openrepository.mephi.ru/handle/123456789/17952