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Deposition of Metal-Doped Diamond-Like Films Using a Hollow Cathode Discharge

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dc.contributor.authorSorokin, I. A.
dc.contributor.authorKolodko, D. V.
dc.contributor.authorKrasnobaev, K. I.
dc.contributor.authorСорокин, Иван Александрович
dc.contributor.authorКолодко, Добрыня Вячеславич
dc.date.accessioned2024-11-25T18:19:13Z
dc.date.available2024-11-25T18:19:13Z
dc.date.issued2020
dc.description.abstract© 2020, Pleiades Publishing, Inc.Abstract—A simple technique is presented for producing diamond-like films with copper impurity by sputtering the surface of a copper cathode with argon ions in a glow discharge with a hollow cathode with simultaneous chemical deposition diamond-like films on its surface. It was shown that a small (up to 1: 1000) admixture of propane at the pressure of the plasma forming gas of 40 Pa does not affect the plasma parameters, however, it allows you to vary the relative copper content in the diamond-like film.
dc.format.extentС. 286-289
dc.identifier.citationSorokin, I. A. Deposition of Metal-Doped Diamond-Like Films Using a Hollow Cathode Discharge / Sorokin, I.A., Kolodko, D.V., Krasnobaev, K.I. // Journal of Communications Technology and Electronics. - 2020. - 65. - № 3. - P. 286-289. - 10.1134/S1064226920030183
dc.identifier.doi10.1134/S1064226920030183
dc.identifier.urihttps://www.doi.org/10.1134/S1064226920030183
dc.identifier.urihttps://www.scopus.com/record/display.uri?eid=2-s2.0-85083258605&origin=resultslist
dc.identifier.urihttp://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000524309600012
dc.identifier.urihttps://openrepository.mephi.ru/handle/123456789/20622
dc.relation.ispartofJournal of Communications Technology and Electronics
dc.titleDeposition of Metal-Doped Diamond-Like Films Using a Hollow Cathode Discharge
dc.typeArticle
dspace.entity.typePublication
oaire.citation.issue3
oaire.citation.volume65
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