Publication:
Effect of substrate biasing on deuterium retention in deuterium-tungsten co-deposited films at 380 K

dc.contributor.authorKrat, S.
dc.contributor.authorKolodko, D. V.
dc.contributor.authorSorokin, I.
dc.contributor.authorEfimov, N.
dc.contributor.authorPrishvitsyn, A.
dc.contributor.authorLomonosov, G. S.
dc.contributor.authorKharkov, M. M.
dc.contributor.authorTumarkin, A.
dc.contributor.authorKaziev, A. V.
dc.contributor.authorGasparyan, Y.
dc.contributor.authorPisarev, A.
dc.contributor.authorКрат, Степан Андреевич
dc.contributor.authorКолодко, Добрыня Вячеславич
dc.contributor.authorСорокин, Иван Александрович
dc.contributor.authorЕфимов, Никита Евгеньевич
dc.contributor.authorПришвицын, Александр Сергеевич
dc.contributor.authorЛомоносов, Глеб Сергеевич
dc.contributor.authorХарьков, Максим Михайлович
dc.contributor.authorТумаркин, Александр Владимирович
dc.contributor.authorКазиев, Андрей Викторович
dc.contributor.authorГаспарян, Юрий Микаэлович
dc.contributor.authorПисарев, Александр Александрович
dc.date.accessioned2026-03-13T07:43:55Z
dc.date.available2026-03-13T07:43:55Z
dc.date.issued2026
dc.identifier.citationEffect of substrate biasing on deuterium retention in deuterium-tungsten co-deposited films at 380 K / Krat, S. [et al.] // Journal of Nuclear Materials. - 2026. - 619. - 10.1016/j.jnucmat.2025.156264
dc.identifier.doi10.1016/j.jnucmat.2025.156264
dc.identifier.urihttps://www.doi.org/10.1016/j.jnucmat.2025.156264
dc.identifier.urihttps://www.scopus.com/record/display.uri?eid=2-s2.0-105021002058&origin=resultslist
dc.identifier.urihttps://openrepository.mephi.ru/handle/123456789/41342
dc.relation.ispartofJournal of Nuclear Materials
dc.titleEffect of substrate biasing on deuterium retention in deuterium-tungsten co-deposited films at 380 K
dc.typeArticle
dspace.entity.typePublication
oaire.citation.volume619
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