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Diffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System

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dc.contributor.authorButnyakov, D. A.
dc.contributor.authorSorokin,I.A.
dc.contributor.authorKolodko, D. V.
dc.contributor.authorБутняков, Даниил Алексеевич
dc.contributor.authorСорокин, Иван Александрович
dc.contributor.authorКолодко, Добрыня Вячеславич
dc.date.accessioned2025-05-16T12:36:05Z
dc.date.available2025-05-16T12:36:05Z
dc.date.issued2025
dc.identifier.citationButnyakov, D. A. Diffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System / Butnyakov, D. A., Sorokin, I.A., Kolodko, D. V. // Plasma Chemistry and Plasma Processing. - 2025. - 10.1007/s11090-025-10550-7
dc.identifier.doi10.1007/s11090-025-10550-7
dc.identifier.urihttps://www.doi.org/10.1007/s11090-025-10550-7
dc.identifier.urihttps://www.scopus.com/record/display.uri?eid=2-s2.0-105003169349&origin=resultslist
dc.identifier.urihttps://openrepository.mephi.ru/handle/123456789/37063
dc.relation.ispartofPlasma Chemistry and Plasma Processing
dc.titleDiffusion Transport of Target Material for a Planar Asymmetrical Hollow Cathode Sputtering System
dc.typeArticle
dspace.entity.typePublication
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