Publication: Green Lithography for Delicate Materials
Дата
2021
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© 2021 Wiley-VCH GmbHA variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low-dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top-down and bottom-up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub-micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water-based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale.
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Green Lithography for Delicate Materials / Grebenko, A. [et al.] // Advanced Functional Materials. - 2021. - 10.1002/adfm.202101533
URI
https://www.doi.org/10.1002/adfm.202101533
https://www.scopus.com/record/display.uri?eid=2-s2.0-85104765561&origin=resultslist
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000642643800001
https://openrepository.mephi.ru/handle/123456789/24057
https://www.scopus.com/record/display.uri?eid=2-s2.0-85104765561&origin=resultslist
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000642643800001
https://openrepository.mephi.ru/handle/123456789/24057