Publication: SOI CMOS, SiGe BiCMOS, GaAs HBT and GaAs PHEMT Technologies Characterization for Radiation-Tolerant Microwave Applications
dc.contributor.author | Sotskov, D. I. | |
dc.contributor.author | Kuznetsov, A. G. | |
dc.contributor.author | Elesin, V. V. | |
dc.contributor.author | Usachev, N. A. | |
dc.contributor.author | Chukov, G. V. | |
dc.contributor.author | Nikiforov, A. Y. | |
dc.contributor.author | Сотсков, Денис Иванович | |
dc.contributor.author | Кузнецов, Александр Геннадьевич | |
dc.contributor.author | Елесин, Вадим Владимирович | |
dc.contributor.author | Усачев, Николай Александрович | |
dc.contributor.author | Чуков, Георгий Викторович | |
dc.contributor.author | Никифоров, Александр Юрьевич | |
dc.date.accessioned | 2024-11-29T16:23:26Z | |
dc.date.available | 2024-11-29T16:23:26Z | |
dc.date.issued | 2021 | |
dc.description.abstract | © 2021 IEEE.Radiation-oriented (RO-) and microwave (MW) characterization of the several process technologies - CMOS silicon-on-insulator (SOI) 180 nm process, CMOS 90 nm process, SiGe BiCMOS 0.42/0.25 μm process, GaAs heterojunction bipolar transistor (HBT) 2 μm process and GaAs pseudomorphic high electron mobility transistor (PHEMT) 0.5 μm process, which suitable for the development of radiation-tolerance transceiver integrated circuits with operating frequencies up to 30 GHz are presented. The results of MW-characterization showed two process technologies manufacturing in "foundry"mode - CMOS SOI 180 nm and CMOS 90 nm potentiality for the development of transceiver ICs with operating frequencies above 3 GHz and 12 GHz respectively. Obtained experimental results allow to determine radiation-tolerance indicators for the total ionizing dose, neutrons, impulse exposure and heavy ions and specify critical elements and IP-block fragments for given processes. Experimental data can be used at the first step of reasonable choice of process technologies for radiation-tolerant transceiver design. | |
dc.identifier.citation | SOI CMOS, SiGe BiCMOS, GaAs HBT and GaAs PHEMT Technologies Characterization for Radiation-Tolerant Microwave Applications / Sotskov, D.I. [et al.] // SIBCON 2021 - International Siberian Conference on Control and Communications. - 2021. - 10.1109/SIBCON50419.2021.9438923 | |
dc.identifier.doi | 10.1109/SIBCON50419.2021.9438923 | |
dc.identifier.uri | https://www.doi.org/10.1109/SIBCON50419.2021.9438923 | |
dc.identifier.uri | https://www.scopus.com/record/display.uri?eid=2-s2.0-85107682050&origin=resultslist | |
dc.identifier.uri | http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000680842100071 | |
dc.identifier.uri | https://openrepository.mephi.ru/handle/123456789/24202 | |
dc.relation.ispartof | SIBCON 2021 - International Siberian Conference on Control and Communications | |
dc.title | SOI CMOS, SiGe BiCMOS, GaAs HBT and GaAs PHEMT Technologies Characterization for Radiation-Tolerant Microwave Applications | |
dc.type | Conference Paper | |
dspace.entity.type | Publication | |
relation.isAuthorOfPublication | cadd9d6c-774c-43ae-b00e-388fa8690f2d | |
relation.isAuthorOfPublication | 438da91a-86f8-43ed-9774-dcb61757a6c5 | |
relation.isAuthorOfPublication | 608226cb-7326-48db-8860-0267814b0820 | |
relation.isAuthorOfPublication | fc7699f3-cbf0-4021-9c88-a08fa1c76ad3 | |
relation.isAuthorOfPublication | d724e4cb-714a-4e50-a262-ce949f36fd58 | |
relation.isAuthorOfPublication | 7689eb3e-fb40-4450-8e40-24096dc74d56 | |
relation.isAuthorOfPublication.latestForDiscovery | cadd9d6c-774c-43ae-b00e-388fa8690f2d | |
relation.isOrgUnitOfPublication | 06e1796d-4f55-4057-8d7e-bb2f3b5676f5 | |
relation.isOrgUnitOfPublication | 543ffddb-d115-4466-be75-83b0f2c5a473 | |
relation.isOrgUnitOfPublication.latestForDiscovery | 06e1796d-4f55-4057-8d7e-bb2f3b5676f5 |