Publication: Automated unit of the chemical wet etching
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2019
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© Published under licence by IOP Publishing Ltd. This paper is devoted to the development of wet etching unit and its control system. The experimental model represents the reaction chamber, equipped with the stirrer and steam-gas condenser, located inside the heated chamber. The unit is also equipped with heat-insulated reservoirs for preheating of etchants and water. The control system provides automated supplying of liquids into the reaction chamber. This allows realizing multistage etching in single technological cycle with etchants replacement and substrate washing, without its extraction from the reaction chamber. With using the unit was studied deep anisotropic etching of silicon in various alkaline etchants. Was revealed, that unit provides the uniformity of etched surface on the level of about 1 μm.
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Sukhoroslova, Y. V. Automated unit of the chemical wet etching / Sukhoroslova, Y.V., Veselov, D.S., Voronov, Y.A. // IOP Conference Series: Materials Science and Engineering. - 2019. - 475. - № 1. - 10.1088/1757-899X/475/1/012005