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Radiation nanotechnology for selective modifications of atomic composition and properties of thin film materials

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dc.contributor.authorDementyeva, M. M.
dc.contributor.authorGurovich, B. A.
dc.contributor.authorKutuzov, L. V.
dc.contributor.authorGoncharov, B. V.
dc.contributor.authorPrikhodko, K. E.
dc.contributor.authorПриходько, Кирилл Евгеньевич
dc.date.accessioned2024-11-21T09:50:52Z
dc.date.available2024-11-21T09:50:52Z
dc.date.issued2019
dc.description.abstract© Published under licence by IOP Publishing Ltd.We have demonstrated using of ion beam irradiation to control the atomic composition and properties of thin film materials by three different ways. Selective removal of atoms (SRA) technique allows us to transform Co3O4 to Co. By EELS on cross-section samples in STEM mode it was shown that target depth recovery profile has no monotonic character that proved the radiation nature of SRA process. Selective displacement of Atoms (SDA) technique under oxygen ion irradiation was used to control the critical current of ultrathin superconductive NbN film that can have an implementation during new cryogenic logic device design.
dc.identifier.citationRadiation nanotechnology for selective modifications of atomic composition and properties of thin film materials / Dementyeva, M.M. [et al.] // IOP Conference Series: Materials Science and Engineering. - 2019. - 525. - № 1. - 10.1088/1757-899X/525/1/012013
dc.identifier.doi10.1088/1757-899X/525/1/012013
dc.identifier.urihttps://www.doi.org/10.1088/1757-899X/525/1/012013
dc.identifier.urihttps://www.scopus.com/record/display.uri?eid=2-s2.0-85067815859&origin=resultslist
dc.identifier.urihttp://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000490925000013
dc.identifier.urihttps://openrepository.mephi.ru/handle/123456789/18306
dc.relation.ispartofIOP Conference Series: Materials Science and Engineering
dc.titleRadiation nanotechnology for selective modifications of atomic composition and properties of thin film materials
dc.typeConference Paper
dspace.entity.typePublication
oaire.citation.issue1
oaire.citation.volume525
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relation.isAuthorOfPublication.latestForDiscovery162432cf-0190-45b0-93f6-e38eae07a362
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