Publication:
Mueller-Matrix Stress Mapping in TeO2 Crystals Under Dynamic Loading

creativeworkseries.issn2079-3537
dc.contributor.authorKhokhlov, D. D.
dc.contributor.authorBykov, A. A.
dc.contributor.authorMarchenkov, A. Yu.
dc.contributor.authorPisarevsky, Yu. V.
dc.contributor.authorEliovich, Ya. A.
dc.contributor.authorAkkuratov, V. I.
dc.contributor.authorKhvostov, A. A.
dc.date.accessioned2023-09-29T10:24:16Z
dc.date.available2023-09-29T10:24:16Z
dc.date.issued2023
dc.description.abstractComponents of optoelectronic devices installed in aircrafts and space vehicles experience significant mechanical loads during their operation. Excessive and cyclic loads may lead to the defect growth or the fatigue failure. In this paper, we describe a non-destructive imaging technique for stress mapping in anisotropic crystalline materials during bench test. The technique is based on Mueller-matrix imaging and the material photoelasticity. The results of experimental studies for two observation directions coinciding with different crystallographic axes of TeO2 are presented. Main limitations and further potential development of the technique are discussed.
dc.identifier.citationD.D. Khokhlov, A.A. Bykov, A.Yu. Marchenkov, Yu.V. Pisarevsky, Ya.A. Eliovich, V.I. Akkuratov, A.A. Khvostov. Mueller-Matrix Stress Mapping in TeO2 Crystals Under Dynamic Loading (2023). Scientific Visualization 15.3: 101 - 107, DOI: 10.26583/sv.15.3.11
dc.identifier.doi10.26583/sv.15.3.11
dc.identifier.doi10.26583/sv.15.3.11
dc.identifier.issn2079-3537
dc.identifier.urihttps://openrepository.mephi.ru/handle/123456789/371
dc.identifier.urihttps://sv-journal.org/2023-3/11/
dc.relation.ispartofScientific Visualization
dc.subjectMechanical stress visualization
dc.subjectComputational imaging
dc.subjectMueller-matrix imaging
dc.subjectNon-destructive testing
dc.subjectCrystal TeO2
dc.subjectCrystalline materials
dc.titleMueller-Matrix Stress Mapping in TeO2 Crystals Under Dynamic Loading
dc.typejournal-article
dspace.entity.typePublication
oaire.citation.issue3
oaire.citation.volume15
relation.isJournalIssueOfPublicationcb4be8e6-593b-4c6c-af27-42c7167425bf
relation.isJournalIssueOfPublication.latestForDiscoverycb4be8e6-593b-4c6c-af27-42c7167425bf
relation.isJournalOfPublication95b5bb8c-faac-4680-a70f-5adf56268bdc
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