Publication:
Ab initio calculation of field emission from metal surfaces with atomic-scale defects

Дата
2019
Авторы
Toijala, H.
Eimre, K.
Kyritsakis, A.
Zadin, V.
Djurabekova, F.
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Научные группы
Организационные подразделения
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Организационная единица
Институт лазерных и плазменных технологий
Стратегическая цель Института ЛаПлаз – стать ведущей научной школой и ядром развития инноваций по лазерным, плазменным, радиационным и ускорительным технологиям, с уникальными образовательными программами, востребованными на российском и мировом рынке образовательных услуг.
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Аннотация
© 2019 American Physical Society.In this work we combine density functional theory and quantum transport calculations to study the influence of atomic-scale defects on the work function and field emission characteristics of metal surfaces. We develop a general methodology for the calculation of the field emitted current density from nanofeatured surfaces, which is then used to study specific defects on a Cu(111) surface. Our results show that the inclusion of a defect can significantly locally enhance the field emitted current density. However, this increase is attributed solely to the decrease of the work function due to the defect, with the effective field enhancement being minute. Finally, the Fowler-Nordheim equation is found to be valid when the modified value for the work function is used, with only an approximately constant factor separating the computed currents from those predicted by the Fowler-Nordheim equation.
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Цитирование
Ab initio calculation of field emission from metal surfaces with atomic-scale defects / Toijala, H. [et al.] // Physical Review B. - 2019. - 100. - № 16. - 10.1103/PhysRevB.100.165421
URI
https://www.doi.org/10.1103/PhysRevB.100.165421
 https://www.scopus.com/record/display.uri?eid=2-s2.0-85074449365&origin=resultslist
 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000492969600005
 https://openrepository.mephi.ru/handle/123456789/19713
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