2023, Pisarev, A. A., Tarasyuk, G. M., Borisyuk, P. V., Isaenkova, M. G., Lebedinskii, Yu. Yu., Zaripova, M. M., Исаенкова, Маргарита Геннадьевна, Писарев, Александр Александрович, Тарасюк, Григорий Михайлович, Борисюк, Петр Викторович, Лебединский, Юрий Юрьевич

Aluminum oxide layers in all its various forms have become widespread due to the unique combination of properties that can be modified by varying the conditions of their growth. The alumina layer can either be applied to the substrate by chemical and physical methods or grown by oxidation. For practical purposes, layers of various thicknesses and structures are needed. The standard method for obtaining thick (of the order of 100-1000 nm) porous layer is electric arc anodization in weak electrolytes. The standard method for obtaining thin (about 10 nm) layers is thermal oxidation. Dense layers of intermediate thickness are difficult to obtain by such methods. There are few papers in the literature that investigate the possibility of obtaining oxide layers with a thickness of tens of nanometers by oxidizing aluminum in oxygen plasma [1-5]. The description of the kinetics of the oxidation process in those works was given on the basis of the assumption of the diffusion character of oxygen transfer from the surface into the interior of the metal. This approach is absolutely unsuitable for description the transport of oxygen and aluminum through the oxide layer, since both oxygen and aluminum in the oxide are in the form of ions, and an electric charge is formed on the surface of the dielectric facing the plasma, so that the transport of oxygen coming from the plasma must occur under by the action of an electric field in the oxide dielectric layer. In this work, experiments on plasma enhanced oxidation (PEO) were carried out on the oxidation of aluminum in the anomalous glow discharge oxygen plasma, which provides uniform treatment over the entire surface of samples of arbitrary shape. Also, a simple model was proposed for description of the oxidation kinetics, taking into account oxygen transport in the electric field.

2017, Васильев, О. С., Борисюк, П. В., Козлова, Т. И., Лебединский, Ю. Ю., Борисюк, Петр Викторович, Лебединский, Юрий Юрьевич, Козлова, Татьяна Ивановна, Васильев, Олег Станиславович

The results of the study of electron properties evolution of monodisperse thin films consisted of Ta and Mo metal nanoclusters deposited onto the SiO2/Si(001) surface with magnetron sputtering method are presented. The changes in chemical composition and electron structure of the samples were controlled by means of X-ray photoelectron spectroscopy in the UHV analysis chamber of the Multiprobe MXPS RM VT AFM-25 surface analysis system. Susceptibility to oxidation after exposure to atmosphere was studied.