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Mathematical modeling of the process of reduction of tungsten hexafluoride with hydrogen

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dc.contributor.authorZhukzhanova, A.
dc.contributor.authorShvab, A.
dc.contributor.authorBrendakov, V.
dc.date.accessioned2024-11-21T11:16:13Z
dc.date.available2024-11-21T11:16:13Z
dc.date.issued2019
dc.description.abstract© 2019 American Institute of Physics Inc.. All rights reserved.The paper considers the process of reduction of gaseous tungsten hexafluoride with hydrogen to metallic tungsten using the chemical vapor deposition method (CVD) [1]. The essence of this method is that the final product is formed on the target substrate, as a result of the interaction of gaseous precursor substances or the thermolysis of the vapor of the precursor substance. On the basis of a complete diffusion model of the process of reducing gaseous tungsten hexafluoride with hydrogen, original boundary conditions were written on the substrate surface, which allowed us to obtain a closed system of second-order differential equations in partial derivatives representing the mathematical model of the process under study [2-5].
dc.identifier.citationZhukzhanova, A. Mathematical modeling of the process of reduction of tungsten hexafluoride with hydrogen / Zhukzhanova, A., Shvab, A., Brendakov, V. // AIP Conference Proceedings. - 2019. - 2135. - 10.1063/1.5120702
dc.identifier.doi10.1063/1.5120702
dc.identifier.urihttps://www.doi.org/10.1063/1.5120702
dc.identifier.urihttps://www.scopus.com/record/display.uri?eid=2-s2.0-85070984795&origin=resultslist
dc.identifier.urihttps://openrepository.mephi.ru/handle/123456789/18576
dc.relation.ispartofAIP Conference Proceedings
dc.titleMathematical modeling of the process of reduction of tungsten hexafluoride with hydrogen
dc.typeConference Paper
dspace.entity.typePublication
oaire.citation.volume2135
relation.isOrgUnitOfPublicationf2e6b525-f6bc-4c2e-a30f-2e3159d9a463
relation.isOrgUnitOfPublication.latestForDiscoveryf2e6b525-f6bc-4c2e-a30f-2e3159d9a463
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