Publication: Analysis of the microstructural evolution of silicon nitride irradiated with swift Xe ions
Дата
2020
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© 2019 Elsevier Ltd and Techna Group S.r.l.The evolution of 220 MeV Xe ion induced radiation damage in polycrystalline Si3N4 is studied, within the fluence range 5 × 1011– 2 × 1014 cm−2, using transmission electron microscopy techniques. These irradiation conditions allow for the study of track morphology in both crystalline and in radiation-amorphized Si3N4. The average track size in the polycrystalline samples is 1.9 ± 0.4 nm and 3.1 ± 0.5 nm in the radiation-amorphized samples. The larger track sizes in the radiation-amorphized material is in agreement with predictions of the inelastic thermal spike model and the role of thermal conductivity in latent track formation.
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Analysis of the microstructural evolution of silicon nitride irradiated with swift Xe ions / Janse, van, Vuuren, A. [et al.] // Ceramics International. - 2020. - 46. - № 6. - P. 7155-7160. - 10.1016/j.ceramint.2019.11.209
URI
https://www.doi.org/10.1016/j.ceramint.2019.11.209
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https://www.scopus.com/record/display.uri?eid=2-s2.0-85079723126&origin=resultslist
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000519661800020
https://openrepository.mephi.ru/handle/123456789/20313