Publication:
Surface ionization wave propagation in the nanosecond pulsed surface dielectric barrier discharge: the influence of dielectric material and pulse repetition rate

Дата
2020
Авторы
Huang, B. D.
Zhang, C.
Adamovich, I.
Akishev, Y.
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Научные группы
Организационные подразделения
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Институт лазерных и плазменных технологий
Стратегическая цель Института ЛаПлаз – стать ведущей научной школой и ядром развития инноваций по лазерным, плазменным, радиационным и ускорительным технологиям, с уникальными образовательными программами, востребованными на российском и мировом рынке образовательных услуг.
Выпуск журнала
Аннотация
In this work, the propagation of the surface ionization wave (SIW) in the nanosecond pulsed surface dielectric barrier discharge with different dielectric materials and pulse repetition rates is investigated. The current waveforms at different locations along the route of the SIW propagation are obtained, based on a specially designed ground strip array geometry. The temporal evolution and spatial distribution of the electric field during the SIW propagation are measured by using the electric field induced second harmonic generation method. The distribution of the residual surface potential after the discharge is mapped with a Kelvin electrostatic probe, which verifies both the existence of the residual electric field and its opposite direction to that during the SIW propagation. It is found that with the dielectric material on which the surface charges decay faster, there are the well-pronounced primary and secondary SIWs with a higher velocity on the voltage rising edge and both the peak current and the peak electric field are also higher, with a less spatial attenuation along the SIW propagation route. It is demonstrated that the residual surface charges with the same polarity as the high-voltage pulse suppress the development of the SIW.
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Цитирование
Surface ionization wave propagation in the nanosecond pulsed surface dielectric barrier discharge: the influence of dielectric material and pulse repetition rate / Huang, BD [et al.] // Plasma Sources Science and Technology. - 2020. - 29. - № 4. - 10.1088/1361-6595/ab7854
URI
https://www.doi.org/10.1088/1361-6595/ab7854
 https://www.scopus.com/record/display.uri?eid=2-s2.0-85083237046&origin=resultslist
 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000522196700001
 https://openrepository.mephi.ru/handle/123456789/20529
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