Publication:
Effect of thermal annealing on SHI irradiated indium implanted glassy carbon

Файлы
W3174242273.pdf(1.7 MB)
Дата
2021
Авторы
Njoroge, E. G.
Hlatshwayo, T. T.
Mlambo, M.
Odutemowo, O.
Skuratov, V. A.
Journal Title
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Volume Title
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Научные группы
Организационные подразделения
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Организационная единица
Институт ядерной физики и технологий
Цель ИЯФиТ и стратегия развития - создание и развитие научно-образовательного центра мирового уровня в области ядерной физики и технологий, радиационного материаловедения, физики элементарных частиц, астрофизики и космофизики.
Выпуск журнала
Аннотация
© 2021 Elsevier B.V.The effects of swift heavy ion irradiation on implanted glassy carbon, the modification and migration of indium after vacuum annealing have been investigated. Radiation damage was introduced to the glassy carbon substrates after room temperature implantation by 360 keV indium ions to a fluence of 2.0 × 1016 ions/cm 2. The implanted samples were subsequently irradiated at room temperature by swift heavy ions (167 MeV Xe 26+ ions). Isochronal annealing of both sets of samples from 200 to 600 °C for 1 h was performed in vacuum. The SHI irradiation, induced some restructuring in the damaged glassy carbon substrates. Vacuum annealing of the SHI irradiated samples gave rise to recovery and the diffusion of implanted In which was different from that of the as-implanted sample. Higher retention was observed at each temperature for SHI irradiated samples compared to as-implanted samples. The diffusion coefficients of the SHI irradiated samples were lower than for un-irradiated sample.
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Цитирование
Effect of thermal annealing on SHI irradiated indium implanted glassy carbon / Njoroge, E.G. [et al.] // Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. - 2021. - 502. - P. 66-72. - 10.1016/j.nimb.2021.06.011
URI
https://www.doi.org/10.1016/j.nimb.2021.06.011
 https://www.scopus.com/record/display.uri?eid=2-s2.0-85108363428&origin=resultslist
 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS_CPL&DestLinkType=FullRecord&UT=WOS:000678448800010
 https://openrepository.mephi.ru/handle/123456789/24279
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