Персона: Ефимов, Никита Евгеньевич
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Институт лазерных и плазменных технологий
Стратегическая цель Института ЛаПлаз – стать ведущей научной школой и ядром развития инноваций по лазерным, плазменным, радиационным и ускорительным технологиям, с уникальными образовательными программами, востребованными на российском и мировом рынке образовательных услуг.
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Никита Евгеньевич
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- ПубликацияОткрытый доступAPPLICATION OF KEV-ENERGY PROTON SCATTERING FOR SURFACE ANALYSIS(НИЯУ МИФИ, 2019) Bulgadaryan, D.; Sinelnikov, D.; Kurnaev, V.; Efimov, N.; Ефимов, Никита Евгеньевич; Синельников, Дмитрий НиколаевичLow- and medium-energy ion scattering (LEIS/MEIS) are widely used techniques of surface analysis [1–4]. Conventional LEIS/MEIS setups utilize noble gas ions and electrostatic energy analyzers that makes these methods very sensitive to composition of the uppermost atomic layers of an analyzed sample. However, high neutralization probability of noble gas ions restricts LEIS/MEIS depth profiling capabilities [5]. The use of hydrogen ions with lower neutralization probability instead of noble gas provides possibility to measure the thickness of surface layer if its atomic mass is very different from that of underlying target, that is the case e.g. in nanoelectronics [6] or for redeposition of plasma-facing materials in fusion devices [7]. In this work we present simulated and experimental data on implementation of keV-energy proton scattering (KEPS) for surface analysis.
- ПубликацияТолько метаданныеApplication of keV-energy proton scattering for thin film analysis(2019) Bulgadaryan, D.; Sinelnikov, D.; Kurnaev, V.; Efimov, N.; Borisyuk, P.; Lebedinskii, Y.; Синельников, Дмитрий Николаевич; Ефимов, Никита Евгеньевич; Борисюк, Петр Викторович; Лебединский, Юрий Юрьевич© 2018 Elsevier B.V. Hydrogen ions are not widely used in low or medium-energy ion scattering spectroscopy. However, in certain cases, the use of non-destructive hydrogen ions with low nuclear stopping may provide additional information compared with noble gas ions. In this work, we describe in situ analysis of nanometer layer deposition of Au on Si and vice versa using keV-energy proton scattering spectroscopy. Ion beam sputtering and thermal evaporation were used for deposition of surface layers. The maximum thickness of deposited layers was measured with X-ray photoelectron spectroscopy and surface profiler. The accuracy of in situ surface layer thickness determination with energy spectra of scattered protons is discussed.
- ПубликацияТолько метаданныеBuilt-In Surface Analyzer for Plasma Devices with Magnetic Field(2019) Bulgadaryan, D. G.; Sinelnikov, D. N.; Sorokin, I. A.; Kurnaev, V. A.; Efimov, N. E.; Синельников, Дмитрий Николаевич; Сорокин, Иван Александрович; Ефимов, Никита Евгеньевич© 2019, Pleiades Publishing, Ltd.The erosion and redeposition processes of plasma-facing materials in fusion devices are the most important factors affecting near-wall and core plasma parameters and device lifetime. To determine the possibility of in situ analyzing these processes, we developed an experimental model of a built-in surface analyzer utilizing low-energy proton scattering spectroscopy. The results of experimental approbation of the method are presented.