Персона: Синельников, Дмитрий Николаевич
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Институт лазерных и плазменных технологий
Стратегическая цель Института ЛаПлаз – стать ведущей научной школой и ядром развития инноваций по лазерным, плазменным, радиационным и ускорительным технологиям, с уникальными образовательными программами, востребованными на российском и мировом рынке образовательных услуг.
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Синельников
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Дмитрий Николаевич
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- ПубликацияТолько метаданныеField Emission from Nanostructured Tendril Bundles(2019) Hwangbo, D.; Kajita, S.; Ohno, N.; Sinelnikov, D.; Bulgadaryan, D.; Kurnaev, V.; Синельников, Дмитрий Николаевич© 1973-2012 IEEE.Field emission from tungsten surfaces with nano-tendril bundles formed after exposure to helium plasma with nitrogen or neon impurities was measured using a vacuum diode device. Field enhancement factor and effective emission area were calculated using the Fowler-Nordheim formula and compared for different types of nanostructures. The field enhancement factor for these structures can reach several thousands and the effective emission area can be more than 1000 nm2. Anode luminescence was detected using long-exposure photography and allowed for estimation of current density near the anode. Unipolar arc tracks were observed on the samples with the highest field emission intensity. We show that field emission from nano-tendril bundles is much higher than that from tungsten fuzz or pure tungsten, and fusion-relevant plasma conditions may lead to arc initiation.
- ПубликацияТолько метаданныеApplication of keV-energy proton scattering for thin film analysis(2019) Bulgadaryan, D.; Sinelnikov, D.; Kurnaev, V.; Efimov, N.; Borisyuk, P.; Lebedinskii, Y.; Синельников, Дмитрий Николаевич; Ефимов, Никита Евгеньевич; Борисюк, Петр Викторович; Лебединский, Юрий Юрьевич© 2018 Elsevier B.V. Hydrogen ions are not widely used in low or medium-energy ion scattering spectroscopy. However, in certain cases, the use of non-destructive hydrogen ions with low nuclear stopping may provide additional information compared with noble gas ions. In this work, we describe in situ analysis of nanometer layer deposition of Au on Si and vice versa using keV-energy proton scattering spectroscopy. Ion beam sputtering and thermal evaporation were used for deposition of surface layers. The maximum thickness of deposited layers was measured with X-ray photoelectron spectroscopy and surface profiler. The accuracy of in situ surface layer thickness determination with energy spectra of scattered protons is discussed.